Title :
Fabrication of multiwavelength simultaneous monitoring device using arrayed-waveguide grating
Author :
Okamoto, K. ; Hattori, K. ; Ohmori, Y.
Author_Institution :
NTT Opto-Electron. Labs., Ibaraki, Japan
fDate :
3/14/1996 12:00:00 AM
Abstract :
The authors demonstrate a novel multiwavelength simultaneous monitoring (MSM) device using silica-based arrayed-waveguide grating (AWG). In the present MSM device, the spectral transmission loss characteristics of the two diffraction beams are devised to cross at the signal wavelength. It is applicable to the unequally spaced WDM systems aiming at the suppression of four-wave mixing problems. The slope coefficient of the discrimination curve was ~0.94 dB/GHz and the monitoring range was ±0.37 nm in the fabricated MSM for use in 8 ch unequally spaced WDM systems
Keywords :
diffraction gratings; multiwave mixing; optical communication equipment; optical fabrication; optical losses; optical waveguides; wavelength division multiplexing; arrayed-waveguide grating; diffraction beams; discrimination curve; four-wave mixing; monitoring range; multiwavelength simultaneous monitoring device fabrication; signal wavelength; silica-based arrayed-waveguide grating; spectral transmission loss characteristics; unequally spaced WDM systems;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19960379
