• DocumentCode
    79578
  • Title

    Fabrication of High Precision Self-Aligned V-Grooves Integrated on Silica-on-Silicon Chips

  • Author

    Yaocheng Shi ; Lei Zhang ; Pengxin Chen ; Sailing He

  • Author_Institution
    State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
  • Volume
    26
  • Issue
    12
  • fYear
    2014
  • fDate
    15-Jun-14
  • Firstpage
    1169
  • Lastpage
    1171
  • Abstract
    In this letter, we propose a simple method to fabricate V-grooves integrated on silica-on-silicon chips. We have utilized the photolithographic self-alignment principle to form the etching mask for V-grooves during waveguide core etching. With such designed processes, the waveguides and V-grooves can be fabricated without any lateral displacement.
  • Keywords
    elemental semiconductors; etching; integrated optoelectronics; masks; optical design techniques; optical fabrication; optical waveguides; photolithography; silicon; silicon compounds; SiO2-Si; etching mask; high precision self-aligned V-grooves; photolithographic self-alignment principle; silica-on-silicon chips; waveguide core etching; Etching; Optical fiber devices; Optical fibers; Photonics; Silicon; Silicon compounds; Silica-on-silicon; V-groove; self-aligned; waveguide;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2014.2316800
  • Filename
    6798653
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=79578