A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array

Author

Yuechun Shi ; Rui Liu ; Shengchun Liu ; Xiaojun Zhu

Author_Institution

Nat. Lab. of Solid State Microstructures, Nanjing Univ., Nanjing, China

Volume

6

Issue

3

fYear

2014

fDate

Jun-14

Firstpage

1

Lastpage

12

Abstract

A new method to fabricate the multiwavelength DFB semiconductor laser array (MLA) is proposed for the first time based on sampled grating and s-bent waveguide. According to the detailed precision analysis, the lasing wavelength accuracy of the proposed structure is significantly improved. Because the common holography exposure and micrometer photolithography are used to fabricate the sampled grating and the bent waveguide in this method, the fabrication cost is very low. Therefore, it offers a suitable method for massive fabrication.

Keywords

diffraction gratings; distributed feedback lasers; holography; optical fabrication; optical waveguides; semiconductor laser arrays; waveguide discontinuities; MLA; grating; holography exposure; lasing wavelength accuracy; micrometer photolithography; multiwavelength DFB semiconductor laser array; precision analysis; s-bent waveguide; Arrayed waveguide gratings; Arrays; Fabrication; Gratings; Semiconductor laser arrays; Waveguide lasers; DFB laser; Sampled grating; bent waveguide; laser array;

fLanguage

English

Journal_Title

Photonics Journal, IEEE

Publisher

ieee

ISSN

1943-0655

Type

jour

DOI

10.1109/JPHOT.2014.2317674

Filename

6798654