DocumentCode :
79611
Title :
Corrections to “Suppression of Drain-Induced Barrier Lowering in Silicon-on-Insulator MOSFETs Through Source/Drain Engineering for Low-Operating-Power System-on-Chip Applications” [Jan 13 260-267]
Author :
Yamada, Tomoaki ; Nakajima, Yoshiki ; Hanajiri, Tatsuro ; Sugano, Tatsuya
Author_Institution :
Bio-Nano Electronics Research Centre, Toyo University, Kawagoe, Japan
Volume :
60
Issue :
12
fYear :
2013
fDate :
Dec. 2013
Firstpage :
4281
Lastpage :
4283
Abstract :
Due to an oversight in the above paper (ibid., vol. 60, no. 1, pp. 260-267, Jan. 2013), Figs. 4-9 appeared in black and white in print. They should have printed in color, as shown here.
Keywords :
Electric potential; Logic gates; MOSFET; Silicon-on-insulator; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2286957
Filename :
6654330
Link To Document :
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