• DocumentCode
    79791
  • Title

    Phase Controlled Class E Amplifier Characteristics for Pulsing Applications

  • Author

    Eroglu, Abdullah

  • Author_Institution
    Dept. of Eng., Purdue Univ., Fort Wayne, IN, USA
  • Volume
    42
  • Issue
    10
  • fYear
    2014
  • fDate
    Oct. 2014
  • Firstpage
    3299
  • Lastpage
    3308
  • Abstract
    Phase controlled Class E amplifiers for high-power plasma pulsing applications are analyzed and their characteristics for pulsing applications are simulated and measured. Harmonic modeling is used to design the phase controlled Class E type amplifiers for plasma pulsing applications, and analytical, simulation, and experimental results are presented. The parameters that affect pulsing characteristics of the phase-controlled Class E amplifiers, including power capacity and thermal characteristics using die dissipation versus pulse frequency are given. Safe operating area of the active devices used in amplifier is simulated and tested for reliable operation. Phase controlled Class E amplifier capacity for ON/OFF pulsing, and 2-level nonzero pulsing for matched and mismatch loads for various cases have been investigated, and critical RF envelope pulsing parameters, such as rise time, fall time, settling time have been studied extensively. Analytical, simulated, and experimental results have been compared and close agreement has been seen.
  • Keywords
    amplifiers; phase control; plasma applications; 2-level nonzero pulsing; ON-OFF pulsing; critical RF envelope pulsing parameters; die dissipation; fall time; harmonic modeling; high-power plasma pulsing applications; matched load; mismatch load; phase-controlled class-E amplifier characteristics; power capacity; pulse frequency; rise time; settling time; thermal characteristics; Harmonic analysis; Impedance; Load modeling; Logic gates; Plasmas; Radio frequency; Transistors; Class E; harmonic modeling; phase controlled; plasma; pulsing; switch-mode amplifiers; wafer processing; wafer processing.;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2014.2332552
  • Filename
    6848786