Title :
Magnetic Properties of Amorphous CoNbZr/AlN Multilayered Films
Author :
Ohnuma, S. ; Hayashide, M. ; Matsumoto, F. ; Fujimori, H.
Author_Institution :
Amorophous Magnetic Devices Laboratory.
fDate :
5/1/1991 12:00:00 AM
Abstract :
The dependence of the magnetic properties of multilayer CoNbZr/AlN films on the conditions of film preparation was investigated. AlN films were prepared by N2 reactive sputtering deposition on CoNbZr films. The soft magnetic properties of the as-deposited films were found to be strongly related to the rf input power during AlN deposition. The anisotropy field decreases drastically at an input power of greater than 2 W/cm2, and a high permeability of around 10,000 (at 5 MHz) was obtained for as-deposited films prepared at an rf input power during A1N deposition of 4.4 W/cm2. SEM observations revealed that CoNbZr films in as-deposited multilayer form have nearly the same morphology as amorphous alloy films annealed at the optimum temperature for reduction of the anisotropy field. The annealing process during film preparation (self-annealing effect) is attributed to the heat generated during AlN deposition, originating mainly in the heat of formation in AlN reactive sputtering.
Keywords :
Amorphous materials; Anisotropic magnetoresistance; Annealing; Magnetic films; Magnetic multilayers; Magnetic properties; Morphology; Nonhomogeneous media; Permeability; Sputtering;
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
DOI :
10.1109/TJMJ.1991.4565172