Title :
Effect of thermal treatment on Rayleigh scattering in silica-based glasses
Author :
Tsujikawa, K. ; Ohashi, M. ; Shiraki, K. ; Tateda, M.
Author_Institution :
NTT Access Network Syst. Labs., Ibaraki, Japan
fDate :
10/26/1995 12:00:00 AM
Abstract :
The effect of thermal treatment on Rayleigh scattering in silica-based glasses is investigated experimentally. Two types of sample glasses, such as `annealed samples´ and `reheated samples´, were prepared by the VAD method with different types of thermal treatment. The authors found that the Rayleigh scattering coefficient of the reheated samples was 5~10% greater than that of the annealed samples because heating up to 1800°C increases the disorder in the SiO4 glass network structure
Keywords :
Rayleigh scattering; annealing; heat treatment; optical fibre losses; optical glass; silicon compounds; 1800 C; Rayleigh scattering; SiO4 glass network structure; VAD method; annealed samples; reheated samples; scattering coefficient; silica-based glasses; thermal treatment;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19951331
