DocumentCode
798341
Title
Base transit time of shallow-base bipolar transistors considering velocity saturation at base-collector junction
Author
Suzuki, Kunihiro ; Nakayama, Noriaki
Author_Institution
Fujitsu Labs. Ltd., Atsugi, Japan
Volume
39
Issue
3
fYear
1992
fDate
3/1/1992 12:00:00 AM
Firstpage
623
Lastpage
628
Abstract
The authors studied the influence of the velocity saturation in the base-collector depletion layer and compared the injected electron concentration profile, collector current density, and base transit time with velocity saturation to those without. The collector current with velocity saturation is only a little smaller than the current without saturation, but the injection electron concentration profile changes substantially when comparing currents with and without velocity saturation. The base transit time is increased by velocity saturation, and the ratio of base transit time with velocity saturation to that without velocity saturation increases as the base width decreases. Thus, velocity saturation must be considered in order to evaluate the base transit time of shallow-base bipolar transistors. The dependence of the base transit time on the doping profile was also analyzed, revealing that the base transit time of a box doping profile is increased more than that of a Gaussian doping profile
Keywords
bipolar transistors; doping profiles; semiconductor device models; base transit time; base-collector depletion layer; base-collector junction; collector current density; doping profile; injected electron concentration profile; modelling; shallow-base bipolar transistors; velocity saturation; Bipolar transistors; Boundary conditions; Current density; Doping profiles; Electron mobility; Gaussian processes; Photonic band gap; Semiconductor process modeling; Spontaneous emission; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.123487
Filename
123487
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