DocumentCode :
799010
Title :
Digital GaAs FET versus Si FET gate delay as predicted from the electron velocity
Author :
Fulkerson, David E.
Author_Institution :
Honeywell Syst. & Res. Center, Bloomington, MN, USA
Volume :
39
Issue :
3
fYear :
1992
fDate :
3/1/1992 12:00:00 AM
Firstpage :
745
Lastpage :
748
Abstract :
A FET model that takes into account the effective saturation velocity (including the effect of velocity overshoot), fringing capacitance, and source resistance is discussed. The model is applied to identical differential source-coupled FET logic gates in both GaAs and Si. The simulated gate delay of the Si logic gate is about 2.6 times that of the GaAs gate, thus refuting the common hypothesis that GaAs gate, thus refuting the common hypothesis that GaAs and Si delays should be about equal because their equilibrium saturated electron velocities are about equal
Keywords :
delays; equivalent circuits; field effect transistors; logic gates; semiconductor device models; DCFL; FET gate delay; FET model; GaAs; HIGFET; Si; differential source-coupled FET logic; digital FET circuits; effective saturation velocity; electron velocity; fringing capacitance; large signal model; logic gate; source resistance; velocity overshoot; Artificial intelligence; Capacitance; Character generation; Delay; Dielectrics; Electron mobility; FETs; Gallium arsenide; Logic gates; Predictive models;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.123507
Filename :
123507
Link To Document :
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