DocumentCode :
799229
Title :
Formation of Ni-Zn-Ferrite Films Using Laser Ablation
Author :
Tanaka, K. ; Omata, Y. ; Nishikawa, Y. ; Yoshida, Y. ; Nakamura, K.
Author_Institution :
Matsushita Electric Industrial Co., Ltd.
Volume :
6
Issue :
11
fYear :
1991
Firstpage :
1001
Lastpage :
1006
Abstract :
Ni-Zn-ferrite thin films were formed on glass substrate by a laser ablation method employing a KrF excimer laser at wave-length 248 nm and frequency 15 Hz. Film was deposited on substrate at room temperature, 200°C and 350°C, to a thickness of 2 ¿m. Ni-Zn-ferrite films thus prepared had the spinel structure when the substrate temperature was raised to 200°C. The saturation magnetic flux densities of Ni-Zn-ferrite films annealed at 400°C were between 1300 and 2020 G. The coercive force of annealed Ni-Zn-ferrite films decreased from 534 to from 70 to 113 Oe as the N2O gas pressure was decreased from 1×10¿2 Torr to 1×10¿5 Torr.
Keywords :
Annealing; Coercive force; Frequency; Glass; Laser ablation; Magnetic films; Magnetic flux density; Sputtering; Substrates; Temperature;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1991.4565294
Filename :
4565294
Link To Document :
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