DocumentCode :
7993
Title :
Development of a Chemically Nonequilibrium Model on Decaying SF _{6} Arc Plasmas
Author :
Tanaka, Yuichi ; Suzuki, Kenji
Author_Institution :
Fac. of Electr. & Comput. Eng., Kanazawa Univ., Kanazawa, Japan
Volume :
28
Issue :
4
fYear :
2013
fDate :
Oct. 2013
Firstpage :
2623
Lastpage :
2629
Abstract :
This paper describes the development of a 2-D thermofluid model with consideration of chemically nonequilibrium effects self-consistently on an SF6 arc plasma in decaying phase. The SF6 arc plasma in decaying phase can be seen in a high-voltage SF6 gas circuit breaker (CB) during a large current interruption process. The developed model here does not assume chemical equilibrium condition in the arc plasma, although the conventional numerical model often assumes the local thermodynamic equilibrium. This developed model accounts for 19 species, including molecules, atoms, monatomic ions, polyatomic ions, and the electrons. It also takes a total of 122 reactions into account, including dissociation, ionization, and other chemical reactions in SF6 plasmas. We successfully calculated transient distribution of the temperature and chemical reaction fields for SF6 arc plasma under a free recovery state for a fundamental study.
Keywords :
arcs (electric); dissociation; gas blast circuit breakers; ionisation; sulphur compounds; transients; 2D thermofluid model; SF6; chemical reactions; chemically nonequilibrium effect; chemically nonequilibrium model; decaying arc plasmas; dissociation; high voltage gas circuit breaker; ionization; large current interruption process; monatomic ions; polyatomic ions; thermodynamic equilibrium; transient distribution; Arc discharges; Circuit breakers; Numerical models; Sulfur hexafluoride; Temperature distribution; Transient analysis; SF $_{6}$ arc; arc interruption; gas circuit breaker;
fLanguage :
English
Journal_Title :
Power Delivery, IEEE Transactions on
Publisher :
ieee
ISSN :
0885-8977
Type :
jour
DOI :
10.1109/TPWRD.2013.2264549
Filename :
6545389
Link To Document :
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