DocumentCode :
799570
Title :
New device structure using array transistors and flexible U-grooves suitable for 18-V, high-performance SOI complementary bipolar LSIs
Author :
Tamaki, Yoichi ; Tsuji, Kousuke ; Otani, Osamu ; Nonami, Hideaki ; Tomatsuri, Toshiyuki ; Yoshida, Eiichi ; Hamamoto, Masato ; Nakazato, Norio
Author_Institution :
Micro Device Div., Hitachi Ltd., Tokyo, Japan
Volume :
18
Issue :
2
fYear :
2005
fDate :
5/1/2005 12:00:00 AM
Firstpage :
272
Lastpage :
278
Abstract :
We have developed a new device structure suitable for high-performance and high-power mixed signal large scale integrations (LSIs) using 0.35-μm SOI complementary bipolar transistors. The new structure is composed of array transistors for various operating currents and flexible U-groove (trench) layout for high-power transistors. Thermal simulation results showed that the thermal resistance could be reduced by 40% by using the flexible U-groove layout. Test structure measurements showed that the maximum operating currents of a double polysilicon self-aligned NPN transistor were improved by 2 and 3.5 times by using ballasting resistors and ballasting resistors with flexible U-groove layout, respectively. The effects of the transistor structure on the thermal resistance and the maximum operating current were discussed.
Keywords :
bipolar transistors; large scale integration; silicon-on-insulator; thermal resistance; 0.35 micron; 18 V; SOI complementary bipolar LSIs; SOI complementary bipolar transistors; Si; array transistors; ballasting resistors; bipolar integrated circuits; complementary circuits; double polysilicon self-aligned NPN transistor; flexible U-groove layout; high-power mixed signal large scale integration; high-power transistors; maximum operating current; safe operation area; silicon-on-insulator technology; thermal resistance reduction; thermal simulation; trench isolation; Automatic testing; Bipolar transistors; Electrical resistance measurement; Electronic ballasts; Large scale integration; Resistors; Silicon on insulator technology; Substrates; Thermal resistance; Thermal stability; Bipolar integrated circuits; complementary circuits; safe operation area; silicon-on-insulator (SOI) technology; thermal resistance; trench isolation;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2005.845017
Filename :
1427795
Link To Document :
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