DocumentCode
799693
Title
Magnetic Properties of Fe-X-N (X=Zr, Hf, Nb, Ta) Films
Author
Nakanishi, K. ; Shimizu, O. ; Yoshida, S.
Author_Institution
Fuji Photo Film Co., Ltd.
Volume
7
Issue
2
fYear
1992
Firstpage
128
Lastpage
134
Abstract
Fe-X-N (X=Zr, Hf, Nb, Ta) ternary system films containing ultra-fine ¿-Fe crystal grains, and whose elements X have a strong affinity for nitrogen that may form amorphous phases, were prepared by sputtering. The dependence of the soft magnetic properties on the film composition was Then investigated. Good soft magnetic properties and high saturation flux density Bs were obtained in each system. In particular, the Fe-Zr-N and Fe-Hf-N systems had a wide soft magnetic range, and films at certain compositions in these systems exhibited zero magnetostriction and high Bs values of up to 16 kG.
Keywords
Amorphous magnetic materials; Amorphous materials; Hafnium; Magnetic films; Magnetic flux; Magnetic properties; Magnetostriction; Niobium; Nitrogen; Sputtering;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1992.4565344
Filename
4565344
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