DocumentCode :
800035
Title :
Soft Magnetic Properties of Fe-Si-N Thin Films
Author :
Yano, N. ; Ohnuma, S. ; Hayashide, M. ; Matsumoto, F. ; Fujimori, H. ; Masumoto, T.
Author_Institution :
Amorphous Magnetic Device Laboratory.
Volume :
7
Issue :
4
fYear :
1992
fDate :
4/1/1992 12:00:00 AM
Firstpage :
295
Lastpage :
300
Abstract :
The crystal structure and magnetic properties of sputter-deposited Fe-Si-N films were investigated. Fe-Si-N films had a single ¿-Fe phase, and with higher N content, two phases, ¿-Fe and ¿´-Fe4N. A coercivity Hc lower than 1 Oe was obtained for single ¿-Fe phase films. The permeability ¿ was found to be strongly related to the substrate temperature Tsub during deposition. For example, deposition at Tsub=230°C gave rise to ¿=3600 at 10 MHz. Such high values were obtained in single ¿-Fe phase films, which consisted of fine crystal grains with a (111) plane orientation. The permeability of films with a high Si concentration was found to have high thermal stability.
Keywords :
Annealing; Coercive force; Magnetic films; Magnetic flux; Magnetic properties; Permeability; Semiconductor films; Sputtering; Substrates; Temperature;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1992.4565382
Filename :
4565382
Link To Document :
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