Single Crystal Fe Films Prepared by a Low Kinetic Energy Sputtering Method

The ga-flow-sputtring (GFS) method, in which atoms with very low kinetic energies (≪0.1 eV) are deposited, was studied as a means of growing single-crystal ¿-Fe films on MgO(001). These films were characterized by reflection high-energy electron diffraction, X-ray diffraction and Kerr-effect magnetometry. The results suggested that single-crystal Fe films grow at a substrate temperature of about 400°C and under a pressure of 1 Torr, at a growth rate of 1100 Ã…/min.