Title :
Microprocessor-Based Control of an Ion Beam Deposition System
Author :
Ahn, Jaeshin ; Stromsmoe, Keith A. ; Lawson, Ronald P.W.
Author_Institution :
The Department of Electrical Engineering, University of Alberta, Edmonton, Alta., Canada.
Abstract :
A microprocessor-based system with 32 A/D, 24 D/A, and 16 ac load controllers, has been designed and built to monitor and control an ion beam thin-film deposition system. The A/D and D/A channels have electrical isolation of 7.5 kV between channels and between input and output. The microprocessor system keeps the ion beam deposition parameters stable for extended periods of operation and it is proposed as a means to greatly simplify switching from one deposition species to another to grow thin multilayer or alloy films.
Keywords :
Acceleration; Communication system control; Control systems; Data acquisition; Ion beams; Ion sources; Microprocessors; Nonhomogeneous media; Power supplies; Sputtering;
Journal_Title :
Industrial Electronics, IEEE Transactions on
DOI :
10.1109/TIE.1985.350117
