• DocumentCode
    802650
  • Title

    Strained-layer 1.5 mu m wavelength InGaAs/InP multiple quantum well lasers grown by chemical beam epitaxy

  • Author

    Tsang, W.T. ; Wu, M.C. ; Yang, L. ; Chen, Y.K. ; Sergent, A.M.

  • Author_Institution
    AT&T Bell Lab., Murray Hill, NJ, USA
  • Volume
    26
  • Issue
    24
  • fYear
    1990
  • Firstpage
    2035
  • Lastpage
    2036
  • Abstract
    A substantial reduction is reported in the threshold current densities for 1.5 mu m wavelength InxGa1-xAs/InxGa1-xAs1-yPy strained-layer multiple quantum well (SL-MQW) lasers over lattice-matched MQW lasers. Threshold current density was found to depend sensitively on the InAs content x and thickness d of the InxGa1-xAs quantum wells. Threshold current densities as low as 370 A/cm2 and internal quantum efficiency of 90% were obtained for separate confinement heterostructure Sl-MQW lasers having four quantum wells and with x=0.65 and d=5 nm. Such a threshold current density is among the lowest values obtained thus far for 1.5 mu m wavelength InGaAs/InGaAsP MQW lasers. The present lasers were grown by chemical beam epitaxy.
  • Keywords
    III-V semiconductors; chemical beam epitaxial growth; gallium arsenide; gallium compounds; indium compounds; laser transitions; semiconductor junction lasers; 1.5 micron; 90 percent; InGaAs-InGaAsP; MQW lasers; chemical beam epitaxy; internal quantum efficiency; multiple quantum well; semiconductor lasers; separate confinement heterostructure; strained-layer; threshold current densities;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19901313
  • Filename
    102601