DocumentCode :
802734
Title :
Growth Process of High-Tc Oxide Thin Films
Author :
Terashima, T. ; Bando, Y.
Author_Institution :
Kyoto University.
Volume :
8
Issue :
6
fYear :
1993
fDate :
6/1/1993 12:00:00 AM
Firstpage :
415
Lastpage :
422
Abstract :
In this review, we describe recent progress in research aimed at understanding the mechanism of growth of high-Tc oxide thin films. Reflection high-energy electron diffraction and atomic force microscope studies have revealed that high-Tc oxide films are grown in a two-dimensional unit cell by unit cell manner. Inter-layer coupling between 1-UCT YBCO layers in YBCO/PrBCO superlattices, such as occurs in magnetic and Josephson phenomena, is also discussed.
Keywords :
Atomic force microscopy; Atomic layer deposition; Couplings; Diffraction; Electron microscopy; Magnetic films; Optical films; Reflection; Transistors; Yttrium barium copper oxide;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1993.4565651
Filename :
4565651
Link To Document :
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