• DocumentCode
    802734
  • Title

    Growth Process of High-Tc Oxide Thin Films

  • Author

    Terashima, T. ; Bando, Y.

  • Author_Institution
    Kyoto University.
  • Volume
    8
  • Issue
    6
  • fYear
    1993
  • fDate
    6/1/1993 12:00:00 AM
  • Firstpage
    415
  • Lastpage
    422
  • Abstract
    In this review, we describe recent progress in research aimed at understanding the mechanism of growth of high-Tc oxide thin films. Reflection high-energy electron diffraction and atomic force microscope studies have revealed that high-Tc oxide films are grown in a two-dimensional unit cell by unit cell manner. Inter-layer coupling between 1-UCT YBCO layers in YBCO/PrBCO superlattices, such as occurs in magnetic and Josephson phenomena, is also discussed.
  • Keywords
    Atomic force microscopy; Atomic layer deposition; Couplings; Diffraction; Electron microscopy; Magnetic films; Optical films; Reflection; Transistors; Yttrium barium copper oxide;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1993.4565651
  • Filename
    4565651
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=802734