DocumentCode
803083
Title
Annealing Effect on Internal Stress in Co/Pt Sputtered Multilayers
Author
Tamura, Y. ; Nawate, M. ; Honda, S.
Author_Institution
Hiroshima University.
Volume
8
Issue
8
fYear
1993
Firstpage
547
Lastpage
554
Abstract
Co/Pt multilayer films were sputter-deposited onto glass substrates with a negative bias voltage applied during sputtering of either Co or Pt layers, and the perpendicular magnetic anisotropy and lattice strain were investigated in detail. An in-plane tensile stress was induced in the Co layers of films with zero bias voltage applied, while a compressive stress was found in biased films. The lattice strain was relaxed by annealing at 400°C in vacuum, resulting in a change in the volume anisotropy. In addition, the annealing causes interdiffusion of Co and Pt, thus decreasing the surface anisotropy energy.
Keywords
Anisotropic magnetoresistance; Annealing; Glass; Internal stresses; Lattices; Magnetic field induced strain; Magnetic films; Magnetic multilayers; Nonhomogeneous media; Voltage;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1993.4565690
Filename
4565690
Link To Document