DocumentCode :
803591
Title :
Transient Ionizing Radiation Effects in MOS/LSI
Author :
Raymond, J.P. ; Pocock, D.N.
Author_Institution :
Northrop Corporate Laboratories Hawthorne, California 90250
Volume :
18
Issue :
6
fYear :
1971
Firstpage :
288
Lastpage :
294
Abstract :
Transient ionizing radiation effects data on six types of MOS/LSI devices are presented considering variations in the pulse width of the radiation environment and circuit design of the MOS/ LSI cell. Four of the device types employed dynamic logic cells and the other two were formed with static logic cells. Transient failure levels of the dynamic arrays occurred with exposure to a total radiation dose of 1-10 rads(Si) through a time as long as 5 ms. The static logic arrays demonstrated significant transient responses at radiation levels of 108 rads(Si)/s, or transient failure of stored information with exposure to a total radiation dose of 10-50 rads(Si).
Keywords :
Ionizing radiation; Large scale integration; Logic arrays; Logic devices; MOSFETs; Photoconductivity; Shift registers; Space vector pulse width modulation; Threshold voltage; Transient response;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1971.4326445
Filename :
4326445
Link To Document :
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