DocumentCode :
804288
Title :
Tb-Fe Sputtered Films with Large Magnetostriction for Use in Magnetomechanical Thin-Film Devices
Author :
Hayashi, Y. ; Honda, T. ; Yamaguchi, M. ; Arai, K.I.
Author_Institution :
Tohoku University
Volume :
9
Issue :
1
fYear :
1994
Firstpage :
124
Lastpage :
128
Abstract :
We examined the magnetostriction and coercive force of amorphous Tb-Fe films sputter-deposited under different conditions (rf input power, Ar gas pressure, Tb content, etc.). Here we discuss the possibility of obtaining both soft magnetic properties and a large magnetostriction in this system. Soft magnetic properties and large magnetostriction were obtained simultaneously in sputtered Tb-Fe thin films prepared with a Tb content of 45 to 50 at%, under an Ar gas pressure of 4 mTorr and with an rf input power of 200 W. This material has strong potential for use in magnetomechanical thin-film devices.
Keywords :
Amorphous magnetic materials; Argon; Magnetic devices; Magnetic films; Magnetic properties; Magnetostriction; Magnetostrictive devices; Soft magnetic materials; Sputtering; Thin film devices;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1994.4565804
Filename :
4565804
Link To Document :
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