DocumentCode :
804845
Title :
Characterization of thin p-clad InGaAs single-quantum-well lasers
Author :
Wu, C.H. ; Zory, P.S. ; Emanuel, M.A.
Author_Institution :
Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
Volume :
7
Issue :
7
fYear :
1995
fDate :
7/1/1995 12:00:00 AM
Firstpage :
718
Lastpage :
720
Abstract :
Low-ridge, thin p-clad InGaAs single-quantum-well (SQW) lasers with shiny Au contacts have been fabricated using a pulsed anodic oxidation technique. Although the ridge is very low (130 nm), the lateral refractive index step is sufficiently large to provide strong lateral waveguiding. Pulsed current measurements of threshold current, operating wavelength, and lateral far field as a function of ridge width are presented and compared with measured values reported for low-ridge and oxide-defined lasers fabricated from conventional thick p-clad material. The CW performance characteristics of five-micron-wide, low-ridge, thin p-clad lasers are shown to be comparable to those of conventional InGaAs SQW high-ridge waveguide lasers.<>
Keywords :
III-V semiconductors; anodisation; gallium arsenide; indium compounds; quantum well lasers; ridge waveguides; waveguide lasers; Au; Au contacts; CW performance; InGaAs; InGaAs SQW low-ridge waveguide lasers; lateral far field; lateral waveguiding; operating wavelength; oxide-defined lasers; p-clad InGaAs single-quantum-well lasers; pulsed anodic oxidation; pulsed current; refractive index step; threshold current; Current measurement; Gold; Indium gallium arsenide; Optical pulses; Oxidation; Pulse measurements; Refractive index; Space vector pulse width modulation; Threshold current; Waveguide lasers;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.393184
Filename :
393184
Link To Document :
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