• DocumentCode
    804845
  • Title

    Characterization of thin p-clad InGaAs single-quantum-well lasers

  • Author

    Wu, C.H. ; Zory, P.S. ; Emanuel, M.A.

  • Author_Institution
    Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
  • Volume
    7
  • Issue
    7
  • fYear
    1995
  • fDate
    7/1/1995 12:00:00 AM
  • Firstpage
    718
  • Lastpage
    720
  • Abstract
    Low-ridge, thin p-clad InGaAs single-quantum-well (SQW) lasers with shiny Au contacts have been fabricated using a pulsed anodic oxidation technique. Although the ridge is very low (130 nm), the lateral refractive index step is sufficiently large to provide strong lateral waveguiding. Pulsed current measurements of threshold current, operating wavelength, and lateral far field as a function of ridge width are presented and compared with measured values reported for low-ridge and oxide-defined lasers fabricated from conventional thick p-clad material. The CW performance characteristics of five-micron-wide, low-ridge, thin p-clad lasers are shown to be comparable to those of conventional InGaAs SQW high-ridge waveguide lasers.<>
  • Keywords
    III-V semiconductors; anodisation; gallium arsenide; indium compounds; quantum well lasers; ridge waveguides; waveguide lasers; Au; Au contacts; CW performance; InGaAs; InGaAs SQW low-ridge waveguide lasers; lateral far field; lateral waveguiding; operating wavelength; oxide-defined lasers; p-clad InGaAs single-quantum-well lasers; pulsed anodic oxidation; pulsed current; refractive index step; threshold current; Current measurement; Gold; Indium gallium arsenide; Optical pulses; Oxidation; Pulse measurements; Refractive index; Space vector pulse width modulation; Threshold current; Waveguide lasers;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.393184
  • Filename
    393184