DocumentCode
804845
Title
Characterization of thin p-clad InGaAs single-quantum-well lasers
Author
Wu, C.H. ; Zory, P.S. ; Emanuel, M.A.
Author_Institution
Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
Volume
7
Issue
7
fYear
1995
fDate
7/1/1995 12:00:00 AM
Firstpage
718
Lastpage
720
Abstract
Low-ridge, thin p-clad InGaAs single-quantum-well (SQW) lasers with shiny Au contacts have been fabricated using a pulsed anodic oxidation technique. Although the ridge is very low (130 nm), the lateral refractive index step is sufficiently large to provide strong lateral waveguiding. Pulsed current measurements of threshold current, operating wavelength, and lateral far field as a function of ridge width are presented and compared with measured values reported for low-ridge and oxide-defined lasers fabricated from conventional thick p-clad material. The CW performance characteristics of five-micron-wide, low-ridge, thin p-clad lasers are shown to be comparable to those of conventional InGaAs SQW high-ridge waveguide lasers.<>
Keywords
III-V semiconductors; anodisation; gallium arsenide; indium compounds; quantum well lasers; ridge waveguides; waveguide lasers; Au; Au contacts; CW performance; InGaAs; InGaAs SQW low-ridge waveguide lasers; lateral far field; lateral waveguiding; operating wavelength; oxide-defined lasers; p-clad InGaAs single-quantum-well lasers; pulsed anodic oxidation; pulsed current; refractive index step; threshold current; Current measurement; Gold; Indium gallium arsenide; Optical pulses; Oxidation; Pulse measurements; Refractive index; Space vector pulse width modulation; Threshold current; Waveguide lasers;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.393184
Filename
393184
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