Title :
Bragg gratings for 1.55-μm wavelength fabricated on semiconductor material by grating-period doubling using a phase mask
Author :
Jensen, Per Inge ; Sudbo, Aasmund
Author_Institution :
Telenor Res., Kjeller, Norway
fDate :
7/1/1995 12:00:00 AM
Abstract :
A 240-nm-period grating has been fabricated in photoresist on semiconductor material by doubling of the phase-mask grating period. A standard mask aligner retrofitted with a UV laser was used for lithography. The phase mask was optimized via numerical simulation of the distribution of optical power in the photoresist.<>
Keywords :
diffraction gratings; integrated optics; numerical analysis; optical communication equipment; optical fabrication; optical waveguides; photoresists; 1.55 mum; 1.55-/spl mu/m wavelength; 240 nm; Bragg gratings; UV laser; grating-period doubling; numerical simulation; optical communications equipment; optical fabrication; optical power distribution; optical waveguides; optimized; phase mask; phase-mask grating period doubling; photoresist; semiconductor material; standard mask aligner; Bragg gratings; Diffraction gratings; Fiber gratings; Holographic optical components; Holography; Lithography; Optical waveguides; Resists; Semiconductor materials; Writing;
Journal_Title :
Photonics Technology Letters, IEEE
