DocumentCode :
805787
Title :
MOSFET mismatch modeling: a new approach
Author :
Klimach, Hamilton ; Arnaud, Alfredo ; Galup-Montoro, Carlos ; Schneider, Márcio C.
Author_Institution :
Dept. of Electr. Eng., Fed. Univ. of Rio Grande do Sul, Brazil
Volume :
23
Issue :
1
fYear :
2006
Firstpage :
20
Lastpage :
29
Abstract :
Digital and analog ICs generally rely on the concept of matched behavior between identically designed devices. Time-independent variations between identically designed transistors, called mismatch, affect the performance of most analog and even digital MOS circuits. This article focuses on the analysis of mismatch in MOS transistors resulting from random fluctuations of the dopant concentration, first studied by Keyes. Today, we recognize these fluctuations as the main cause of mismatch in bulk CMOS transistors.
Keywords :
MOSFET; semiconductor device testing; semiconductor process modelling; MOS transistor mismatch; MOSFET mismatch modeling; analog IC; digital IC; dopant concentration random fluctuations; time-independent variations; CMOS process; CMOS technology; Doping; Fluctuations; Impurities; Integrated circuit modeling; MOSFET circuits; Semiconductor device modeling; Semiconductor process modeling; Solid modeling; MOSFET; integrated circuit design; matching; mismatch compact model; simulation;
fLanguage :
English
Journal_Title :
Design & Test of Computers, IEEE
Publisher :
ieee
ISSN :
0740-7475
Type :
jour
DOI :
10.1109/MDT.2006.20
Filename :
1583535
Link To Document :
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