High-resolution electron beam lithography and DNA nano-patterning for molecular QCA

Author

Hu, Wenchuang ; Sarveswaran, Koshala ; Lieberman, Marya ; Bernstein, Gary H.

Author_Institution

Dept. of Electr. Eng., Univ. of Notre Dame, IN, USA

Volume

4

Issue

3

fYear

2005

fDate

5/1/2005 12:00:00 AM

Firstpage

312

Lastpage

316

Abstract

Electron beam lithography (EBL) patterning of poly(methylmethacrylate) (PMMA) is a versatile tool for defining molecular structures on the sub-10-nm scale. We demonstrate lithographic resolution to about 5 nm using a cold-development technique. Liftoff of sub-10-nm Au nanoparticles and metal lines proves that cold development completely clears the PMMA residue on the exposed areas. Molecular liftoff is performed to pattern DNA rafts with high fidelity at linewidths of about 100 nm. High-resolution EBL and molecular liftoff can be applied to pattern Creutz-Taube molecules on the scale of a few nanometers for quantum-dot cellular automata.

Keywords

DNA; cellular automata; electron beam lithography; gold; molecular biophysics; nanoparticles; nanopatterning; polymers; quantum dots; Au; Au nanoparticles; Creutz-Taube molecules; DNA nanopatterning; cold-development technique; electron beam lithography patterning; high-resolution electron beam lithography; metal grains; molecular electronics; molecular liftoff; molecular quantum-dot cellular automata; molecular structures; nanofabrication; poly(methylmethacrylate); DNA; Electron beams; Lithography; Manufacturing; Molecular beams; Molecular electronics; Nanoparticles; Quantum cellular automata; Quantum dots; Self-assembly; Au nanoparticles; DNA tiling; electron beam lithography (EBL); liftoff; metal grains; molecular electronics; nanofabrication; quantum-dot cellular automata (QCA);

fLanguage

English

Journal_Title

Nanotechnology, IEEE Transactions on

Publisher

ieee

ISSN

1536-125X

Type

jour

DOI

10.1109/TNANO.2005.847034

Filename

1430665