DocumentCode :
805913
Title :
Soft Magnetic Properties of Highly Resistive Co-Al-N Alloy Films
Author :
Ohnuma, S. ; Furukawa, S. ; Matsumoto, F. ; Fujimori, H. ; Takahiro, K. ; Nagata, S. ; Yamaguchi, S. ; Masumoto, T.
Author_Institution :
Amorphous Magnetic Device Lab.
Volume :
9
Issue :
6
fYear :
1994
Firstpage :
138
Lastpage :
145
Abstract :
The effects of the Al and N content on the structure and properties of Co.95Fe.05-Al-N films prepared by rf reactive magnetron sputtering using (N2+Ar) gas were studied. TEM observations revealed that nitrided films are composed of heterogeneous phases with a very fine network structure. It was found that the properties of films are determined mainly by the combination of the Al and N concentrations. The coercivity of films containing more than 10 at% Al decreases with increasing N content, even when the film thickness is more than 2 ¿m. A steep increase in the electrical resistivity and a slight decrease in the magnetization of films containing more than 15 at% Al were observed during the initial increase in the N concentration, and both electrical resistivity and magnetization decreased rapidly when the N concentration was the same as that of Al. These anomalies are attributed to intergranular materials, indicating the presence in these films of a phase rich in Al and N.
Keywords :
Anisotropic magnetoresistance; Coercive force; Electric resistance; Magnetic devices; Magnetic films; Magnetic materials; Magnetic properties; Magnetostriction; Optical films; Soft magnetic materials;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1994.4565971
Filename :
4565971
Link To Document :
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