• DocumentCode
    80680
  • Title

    Excitation of the Azimuthal Surface Waves in Electron Cyclotron Frequency Range by Rotating Electron Beam in a Coaxial Waveguide

  • Author

    Blednov, Oleg S. ; Girka, Igor O. ; Girka, Volodymyr O. ; Pavlenko, Ivan V.

  • Author_Institution
    Kharkiv Nat. Univ., Kharkiv, Ukraine
  • Volume
    42
  • Issue
    3
  • fYear
    2014
  • fDate
    Mar-14
  • Firstpage
    735
  • Lastpage
    741
  • Abstract
    The initial stage of interaction between gyrating beam of electrons, which move along Larmor orbits in a narrow gap between a cylindrical plasma layer and an external screen of a metal coaxial waveguide, and electromagnetic eigenwaves is studied theoretically. These waves are extraordinary polarized; they propagate along the azimuthal angle across an axial external steady magnetic field in the electron cyclotron frequency range. The numerical analysis shows that existence of internal metal conductor affects the magnitude of the growth rate weakly. It narrows the range of effective wavenumbers within which effective wave excitation takes place when compared with the case of absence of this conductor. Excitation of these modes is found to be impossible for resonators with relatively small external radii and low plasma densities when compared with a similar structure completely filled with plasma.
  • Keywords
    coaxial waveguides; numerical analysis; plasma density; plasma electromagnetic wave propagation; plasma filled waveguides; plasma-beam interactions; Larmor orbits; axial external steady magnetic field; azimuthal surface wave propagation; cylindrical plasma layer; effective wavenumbers; electromagnetic eigenwaves; electron beam gyration; electron beam rotation; electron cyclotron frequency range; external screen; growth rate; internal metal conductor; metal coaxial waveguide; numerical analysis; plasma density; similar structure filled plasma; Conductors; Cyclotrons; Electromagnetic waveguides; Electron beams; Plasmas; Surface waves; Particle beams; plasma applications; plasma devices; plasmas;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2014.2300097
  • Filename
    6727518