DocumentCode :
807636
Title :
CMOS Hardening Techniques
Author :
Schlesier, K.M. ; Norris, P.E.
Author_Institution :
RCA Laboratories Princeton, New Jersey
Volume :
19
Issue :
6
fYear :
1972
Firstpage :
275
Lastpage :
281
Abstract :
Complementary symmetry MOS circuits have high noise immunity and low power consumption which make them particularly suitable for military and space applications. A major drawback to their use is radiation sensitivity to accumulated fluences of radiation and also to prompt radiation bursts (transient effects). A significant degree of hardening against transient effects can be achieved by building the circuits in silicon-on-sapphire. This technology provides complete dielectric isolation and reduces photocurrents in the silicon. It is shown that each device type (N and P channel) must operate under both negative and positive gate bias. Therefore, to ensure hardening against an accumulated fluence of radiation, a dielectric which is hard under both polarities of gate bias should be used. Results are presented for CMOS circuits made with Al2O3 gate insulators.
Keywords :
Aluminum oxide; CMOS technology; Circuit noise; Dielectrics; Energy consumption; Isolation technology; Photoconductivity; Radiation hardening; Silicon; Space technology;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1972.4326845
Filename :
4326845
Link To Document :
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