Title :
Optical intensity modulators using diazo-dye-substituted polymer channel waveguides
Author :
Shuto, Yoshito ; Tomaru, Satoru ; Hikita, Makoto ; Amano, M.
Author_Institution :
NTT Opto-Electron. Labs., Ibaraki, Japan
fDate :
8/1/1995 12:00:00 AM
Abstract :
The electrooptic (EO) modulation of 1.32 μm laser light is measured in Mach-Zehnder channel waveguides fabricated with diazo-dye-substituted polymers with coplanar-waveguide (CPW) or microstrip (MS) electrodes. Two types of channel waveguide fabricated by photobleaching or O2 reactive-ion etching (RIE) exhibit the same EO coefficients r33 under the same poling condition. However, the photobleached waveguides show a lower half-wave voltage than the RIE-fabricated ones because of both the optical power concentration in a core layer and the existence of an EO active cladding layer. These tendencies are well explained by considering “effective” overlap integrals between the optical and electric fields, including the distribution of EO-active regions. The maximum r33 value (26 pm/V) of the poled diazo-dye-substituted polymer is obtained with an RIE-fabricated MS-modulator
Keywords :
coplanar waveguides; electro-optical modulation; optical fabrication; optical polymers; optical saturable absorption; optical waveguides; organic compounds; photolithography; sputter etching; 1.32 mum; Mach-Zehnder channel waveguides; O2; O2 reactive-ion etching; coplanar-waveguide electrodes; core layer; diazo-dye-substituted polymer channel waveguides; effective overlap integrals; electrooptic modulation; half-wave voltage; laser light; microstrip electrodes; optical intensity modulators; optical power concentration; photobleached waveguides; photobleaching; poling condition; Coplanar waveguides; Electrooptic modulators; Electrooptical waveguides; Intensity modulation; Lasers and electrooptics; Optical modulation; Optical polymers; Optical waveguides; Photobleaching; Waveguide lasers;
Journal_Title :
Quantum Electronics, IEEE Journal of
