Multiprobe SPM System Using Optical Interference Patterns

This paper proposes a new composition of the multiprobe scanning probe microscopy (SPM) system using optical interference patterns for a parallel nanoimaging in a large-area measurement. We achieved large-scale integration with 50 000 probes fabricated with microelectromechanical systems (MEMS) technology and measured the optical interference patterns with charge-coupled device (CCD), which was difficult in a conventional single scanning probe. In this research, the multiprobes are made of SiN by MEMS process, and the multiprobes are joined with the Pyrex glass by anodic bonding. We designed, fabricated, and evaluated the characteristics of the multiprobe. In addition, we changed the probe shape to decrease the warpage of the SiN probe. We used the supercritical drying to avoid stiction of the SiN probe with the Pyrex glass surface and fabricated the SiN probe without stiction. We took some interference patterns by CCD and measured the position of them. We calculated the probe height using the interference displacement and compared the result with the theoretical deflection curve. As a result, these interference patterns matched the theoretical deflection curve. We found that this multiprobe chip using interference patterns is effective in measurement for a parallel nanoimaging. We also composed the multiprobe SPM system and evaluated the fundamental characteristics