DocumentCode :
811417
Title :
Monte Carlo simulations of the bandwidth of InAlAs avalanche photodiodes
Author :
Ma, Feng ; Li, Ning ; Campbell, Joe C.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Texas, Austin, TX, USA
Volume :
50
Issue :
11
fYear :
2003
Firstpage :
2291
Lastpage :
2294
Abstract :
We present a Monte Carlo simulation of the bandwidth of an InAlAs avalanche photodiode with an undepleted absorber. The carrier velocities are simulated in the charge layer and the multiplication region. It is shown that the velocity overshoot effect is not as significant as simpler models have suggested. At high electric field intensity, the electron effective saturation velocity is only slightly higher when impact ionization is significant, compared with when impact ionization is absent. The simulated 3 dB bandwidth is consistent with experiments for gains up to 50.
Keywords :
III-V semiconductors; Monte Carlo methods; aluminium compounds; avalanche breakdown; avalanche photodiodes; electron mobility; impact ionisation; indium compounds; semiconductor device models; transient response; In0.52Al0.48As; InAlAs avalanche photodiode; InP; InP substrate; Monte Carlo simulation; avalanche multiplication; bandwidth; carrier velocities; charge layer; electron effective saturation velocity; high electric field intensity; impact ionization; impulse response; multiplication region; undepleted absorber; velocity overshoot effect; Absorption; Avalanche photodiodes; Bandwidth; Electrons; Impact ionization; Indium compounds; Indium phosphide; Lattices; Monte Carlo methods; Predictive models;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.818149
Filename :
1239065
Link To Document :
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