DocumentCode :
811531
Title :
High Energy Low Intensity Beam Profile Monitor
Author :
Chehab, R. ; Ngoc, C.Nguyen
Author_Institution :
Laboratoire de l´´Accélérateur Linéaire Université de Paris-Sud, Centre d´´Orsay, Orsay, France
Volume :
20
Issue :
3
fYear :
1973
fDate :
6/1/1973 12:00:00 AM
Firstpage :
662
Lastpage :
664
Abstract :
The principle of this monitor - used in beam emittance measurements on transport lines - is based on secondary emission phenomenon in dielectric layers. Thin aluminium strips covered with low density KCI layer are used. Measurements with electron beams in the range 150 to 400 MeV are made with foils and strips in the region of stable operation. Observations upon avalanche multiplications encountered are also reported.
Keywords :
Aluminum; Argon; Dielectric measurements; Electron beams; Kirchhoff´s Law; Measurement techniques; Monitoring; Potential energy; Strips; Time factors;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1973.4327210
Filename :
4327210
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=811531
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