DocumentCode :
811868
Title :
Contact resistance for small contacts [MOSFET]
Author :
Cumberbatch, Ellis ; Mahinthakumar, Ganamanikam
Author_Institution :
Dept. of Math., Claremont Graduate Sch., CA, USA
Volume :
38
Issue :
12
fYear :
1991
fDate :
12/1/1991 12:00:00 AM
Firstpage :
2669
Lastpage :
2672
Abstract :
An asymptotic analysis for current flow to small contacts in MOSFET source/drain regions is obtained. The formula for end resistance is compared with numerical simulations. It shows good agreement for contacts whose width is smaller than half the diffusion width
Keywords :
boundary-value problems; contact resistance; insulated gate field effect transistors; semiconductor device models; MOSFET source/drain regions; asymptotic analysis; boundary valve problem; contact resistance; current flow; diffusion width; end resistance; model; numerical simulations; small contacts; Conducting materials; Conductivity; Contact resistance; Electrical resistance measurement; Electrostatics; Laplace equations; MOSFET circuits; Manufacturing processes; Mathematics; Shape;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.158689
Filename :
158689
Link To Document :
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