DocumentCode
812123
Title
A new device structure and process flow for a low-leakage p-i-n diode-based integrated detector array
Author
Snoeys, W. ; Plummer, James ; Parker, Stefan ; Kenney, C.
Author_Institution
Center for Integrated Syst., Stanford Univ., CA
Volume
38
Issue
12
fYear
1991
fDate
12/1/1991 12:00:00 AM
Firstpage
2696
Lastpage
2697
Abstract
Summary form only given. A device structure that makes it possible to integrate a one- or two-dimensional array of p-i-n diodes (providing one- or two-dimensional spatial resolution, respectively) with readout circuitry on the same high-resistivity substrate is presented. The spatial resolution is maximized by building the circuitry on top of the detecting elements, while avoiding loss of signal charge into the circuitry. A special gettering step to obtain low leakage in the p-i-n diodes is presented as well. The specific application for which this method was developed is a particle detector for high-energy physics, but many other applications are also possible
Keywords
getters; p-i-n diodes; semiconductor counters; 2D pin diode arrays; device structure; gettering; high-energy physics; high-resistivity substrate; low-leakage p-i-n diode-based integrated detector array; particle detector; process flow; readout circuitry; spatial resolution; Energy barrier; Germanium silicon alloys; Heterojunctions; Hip; Infrared detectors; P-i-n diodes; PIN photodiodes; Photoelectricity; Silicon germanium; Substrates;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.158710
Filename
158710
Link To Document