Title :
Real-time statistical process control using tool data [semiconductor manufacturing]
Author :
Spanos, Costas J. ; Guo, Hai-Fang ; Miller, Alan ; Levine-Parrill, Joanne
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fDate :
11/1/1992 12:00:00 AM
Abstract :
A process monitoring scheme that takes advantage of real-time information in order to generate malfunction alarms is described. This is accomplished with the application of time-series filtering and multivariate statistical process control. This scheme is capable of generating alarms on a true real-time basis, while the wafer is still in the processing chamber. Several examples are presented with tool data collected from the SECSII port of single-wafer plasma etchers
Keywords :
computerised monitoring; integrated circuit manufacture; manufacturing data processing; real-time systems; semiconductor device manufacture; statistical analysis; statistical process control; SECSII port; SPC; malfunction alarms; multivariate statistical process control; process monitoring scheme; real-time information; semiconductor manufacturing; semiconductor wafers; single-wafer plasma etchers; time-series filtering; Condition monitoring; Conductors; Control charts; Filtering; Manufacturing processes; Plasma applications; Plasma temperature; Process control; Semiconductor device manufacture; Valves;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
