• DocumentCode
    813320
  • Title

    An analysis of the instability phenomena of a low-current vacuum arc for copper cathodes

  • Author

    Mungkung, Narong ; Morimiya, Osami ; Kamikawaji, Toru

  • Author_Institution
    Nippon Inst. of Technol., Saitama, Japan
  • Volume
    31
  • Issue
    5
  • fYear
    2003
  • Firstpage
    963
  • Lastpage
    967
  • Abstract
    A cathode spot model is used to analyze the instability phenomena of a vacuum arc. The current below which no real solution exists is believed to be an unstable region. When the current decreases below 19 A, the electrons returning to the sheath region from the plasma region were found to dominate over the positive ions and, thus, the cathode electric field has an imaginary solution. An electrostatic probe was used to confirm these findings, and the analytical results were similar to measurement results. The present cathode spot model may be valid for volatile materials.
  • Keywords
    cathodes; copper; plasma sheaths; vacuum arcs; Cu cathodes; analytical results; cathode electric field; cathode spot model; electrostatic probe; imaginary solution; instability phenomena; low-current vacuum arc; sheath region; unstable region; volatile materials; Cathodes; Copper; Electrons; Electrostatic analysis; Electrostatic measurements; Plasma materials processing; Plasma measurements; Plasma sheaths; Probes; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2003.818422
  • Filename
    1240043