DocumentCode
813320
Title
An analysis of the instability phenomena of a low-current vacuum arc for copper cathodes
Author
Mungkung, Narong ; Morimiya, Osami ; Kamikawaji, Toru
Author_Institution
Nippon Inst. of Technol., Saitama, Japan
Volume
31
Issue
5
fYear
2003
Firstpage
963
Lastpage
967
Abstract
A cathode spot model is used to analyze the instability phenomena of a vacuum arc. The current below which no real solution exists is believed to be an unstable region. When the current decreases below 19 A, the electrons returning to the sheath region from the plasma region were found to dominate over the positive ions and, thus, the cathode electric field has an imaginary solution. An electrostatic probe was used to confirm these findings, and the analytical results were similar to measurement results. The present cathode spot model may be valid for volatile materials.
Keywords
cathodes; copper; plasma sheaths; vacuum arcs; Cu cathodes; analytical results; cathode electric field; cathode spot model; electrostatic probe; imaginary solution; instability phenomena; low-current vacuum arc; sheath region; unstable region; volatile materials; Cathodes; Copper; Electrons; Electrostatic analysis; Electrostatic measurements; Plasma materials processing; Plasma measurements; Plasma sheaths; Probes; Vacuum arcs;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2003.818422
Filename
1240043
Link To Document