DocumentCode :
813340
Title :
Recombination within Disordered Regions: Influence of Barrier Height on Recombination Rate and Injection Level Effects
Author :
Curtis, O.L., Jr. ; Srour, J.R.
Author_Institution :
Northrop Research and Technology Center Hawthorne, California 90250
Volume :
20
Issue :
6
fYear :
1973
Firstpage :
196
Lastpage :
203
Abstract :
Disordered regions are highly effective for recombination in neutron-irradiated silicon and germanium. Extension of an earlier analysis is presented which takes into account the effect of recombination on the local carrier concentration, and qualitatively explains various experimental observations, particularly the variation of lifetime with excess density. Comparisons to Gregory´s impact model are made, and arguments are presented which favor the present analysis. It is observed that the previous conclusion that impurities are unimportant for recombination in neutron-irradiated material may not be valid for practical situations which involve high excess carrier densities.
Keywords :
Electrons; Germanium; Laboratories; Neutrons; Potential well; Predictive models; Radiative recombination; Semiconductor impurities; Semiconductor materials; Silicon;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1973.4327393
Filename :
4327393
Link To Document :
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