DocumentCode :
81358
Title :
A Physics-Based Compact Model of Metal-Oxide-Based RRAM DC and AC Operations
Author :
Peng Huang ; Xiao Yan Liu ; Bing Chen ; Hai Tong Li ; Yi Jiao Wang ; Ye Xin Deng ; Kang Liang Wei ; Lang Zeng ; Bin Gao ; Gang Du ; Xing Zhang ; Jin Feng Kang
Author_Institution :
Key Lab. of Microelectron. Devices & Circuits, Peking Univ., Beijing, China
Volume :
60
Issue :
12
fYear :
2013
fDate :
Dec. 2013
Firstpage :
4090
Lastpage :
4097
Abstract :
A physics-based compact model of metal-oxide-based resistive-switching random access memory (RRAM) cell under dc and ac operation modes is presented. In this model, the conductive filament evolution corresponding to the resistive switching process is modeled by considering the transport behaviors of oxygen vacancies and oxygen ions together with the temperature effect. Both the metallic-like and electron hopping conduction transports are considered to model the conduction of RRAM. The model can reproduce both the typical I-V characteristics of RRAM in high-/low-resistance state (LRS) and the nonlinear characteristics in LRS. Moreover, to accurately model ac operation mode, the effects of parasitic capacitance and resistance are included in our model. The developed compact model is verified and calibrated by measured data in different HfOx-based RRAM devices under dc and ac operation modes. The excellent agreement between the model predictions and experimental results shows a promising prospect of the future implementation of this compact model in large-scale circuit simulation to optimize the design of RRAM.
Keywords :
circuit simulation; electric resistance; hafnium compounds; random-access storage; semiconductor device models; HfOx; I-V characteristics; LRS; RRAM cell; RRAM design; RRAM devices; ac operation modes; conductive filament evolution; dc operation modes; electron hopping conduction transports; high-resistance state; large-scale circuit simulation; low-resistance state; metal-oxide-based RRAM; metal-oxide-based resistive-switching random access memory; metallic-like conduction transports; model predictions; nonlinear characteristics; oxygen ions; oxygen vacancies; parasitic capacitance; parasitic resistance; physics-based compact model; resistive switching process; temperature effect; transport behaviors; Data models; Electrodes; Equations; Integrated circuit modeling; Mathematical model; Resistance; Switches; Circuit simulation; compact model; conduction of resistive-switching random access memory (RRAM); conductive filament´s evolution; parasitic effect; pulse mode; resistive switching;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2287755
Filename :
6655950
Link To Document :
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