DocumentCode
813920
Title
Fuzzy logic models for thermally based microelectronic manufacturing processes
Author
Xie, Hong ; Mahajan, R.L. ; Lee, Yung-Cheng
Author_Institution
Intel Corp., Chandler, AZ, USA
Volume
8
Issue
3
fYear
1995
fDate
8/1/1995 12:00:00 AM
Firstpage
219
Lastpage
227
Abstract
This paper presents fuzzy logic models (FLM) to simulate two thermally based microelectronic manufacturing processes: the “pool boiling” in vapor phase soldering and silicon deposition process in a horizontal chemical vapor deposition (CVD) reactor. After a brief discussion of the various input-output models, we present our general approach to the development of FLM´s, followed by their application to the two case studies. For the pool boiling, experimental data are used to develop the fuzzy logic model. Results show that the FLM not only simulates the different regions of the pool boiling curve satisfactorily, but also faithfully represents the two transitions. For the CVD process, pseudo-analytical equations from Eversteyn´s paper are used to generate data under simulated production conditions. Results show that the model can describe the process very well. The physico-fuzzy model, incorporating the physical understanding of the process, is shown to improve the model´s extrapolation capability
Keywords
boiling; chemical vapour deposition; fuzzy logic; reflow soldering; semiconductor device manufacture; semiconductor process modelling; deposition process; extrapolation capability; fuzzy logic models; horizontal chemical vapor deposition; physico-fuzzy model; pool boiling; simulated production conditions; thermally based microelectronic manufacturing; vapor phase soldering; Chemical vapor deposition; Equations; Extrapolation; Fuzzy logic; Inductors; Manufacturing processes; Microelectronics; Production; Silicon; Soldering;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.400996
Filename
400996
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