• DocumentCode
    813920
  • Title

    Fuzzy logic models for thermally based microelectronic manufacturing processes

  • Author

    Xie, Hong ; Mahajan, R.L. ; Lee, Yung-Cheng

  • Author_Institution
    Intel Corp., Chandler, AZ, USA
  • Volume
    8
  • Issue
    3
  • fYear
    1995
  • fDate
    8/1/1995 12:00:00 AM
  • Firstpage
    219
  • Lastpage
    227
  • Abstract
    This paper presents fuzzy logic models (FLM) to simulate two thermally based microelectronic manufacturing processes: the “pool boiling” in vapor phase soldering and silicon deposition process in a horizontal chemical vapor deposition (CVD) reactor. After a brief discussion of the various input-output models, we present our general approach to the development of FLM´s, followed by their application to the two case studies. For the pool boiling, experimental data are used to develop the fuzzy logic model. Results show that the FLM not only simulates the different regions of the pool boiling curve satisfactorily, but also faithfully represents the two transitions. For the CVD process, pseudo-analytical equations from Eversteyn´s paper are used to generate data under simulated production conditions. Results show that the model can describe the process very well. The physico-fuzzy model, incorporating the physical understanding of the process, is shown to improve the model´s extrapolation capability
  • Keywords
    boiling; chemical vapour deposition; fuzzy logic; reflow soldering; semiconductor device manufacture; semiconductor process modelling; deposition process; extrapolation capability; fuzzy logic models; horizontal chemical vapor deposition; physico-fuzzy model; pool boiling; simulated production conditions; thermally based microelectronic manufacturing; vapor phase soldering; Chemical vapor deposition; Equations; Extrapolation; Fuzzy logic; Inductors; Manufacturing processes; Microelectronics; Production; Silicon; Soldering;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.400996
  • Filename
    400996