Title :
Using wavelength-dependent emissivity of semiconductor wafer to model heat transfer in rapid thermal processing station
Author :
Belikov, Sergey ; Martynov, Helen ; Kaplinsky, Michael ; Manikopoulos, Constantine
Author_Institution :
Dept. of Electr. & Comput. Eng., New Jersey Inst. of Technol., Newark, NJ, USA
fDate :
8/1/1995 12:00:00 AM
Abstract :
This paper develops an approach for using a wavelength-dependent emissivity model of a semiconductor wafer in calculating heat transfer in a rapid thermal processing (RTP) station. The wafer emissivity is modeled by a generalized polynomial in wavelength where the coefficients may be functions of temperature. A comparison of experimental data with simulated results for a silicon wafer is provided
Keywords :
approximation theory; emissivity; heat transfer; polynomials; rapid thermal processing; semiconductor process modelling; temperature distribution; 1000 to 1400 K; Si; Si wafer; generalized polynomial; heat transfer model; rapid thermal processing station; semiconductor wafer; simulation; wafer spectral emissivity; wafer temperatures; wavelength-dependent emissivity; Control systems; Heat transfer; Heating; Lamps; Rapid thermal processing; Semiconductor device modeling; Silicon; Temperature control; Temperature measurement; Temperature sensors;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
