Title :
Bias point thermal shift growth in Z-cut LiNbO3 Modulators
Author :
Nagata, Hirotoshi ; Li, Yagang ; Finch, Andrew ; Voisine, Kenneth R.
Author_Institution :
JDS Uniphase Corp., Bloomfield, CT, USA
fDate :
6/1/2005 12:00:00 AM
Abstract :
Growth of a bias point thermal shift induced by dc bias in z-cut LiNbO3 optical intensity modulators is quantitatively discussed from the standpoint of its impact on field service. During 20 years of device operation under a worst-case dc bias condition, the thermal shift slope grows almost symmetrically with respect to a bias polarity. An initial small thermal shift of around ±7 mV/°C (3σ distribution bounds) increases continuously over time with biased operation at 55°C and approaches ±70 mV/°C after 20 years. This increased temperature sensitivity would generate approximately a 2-V bias point shift toward the bias rail when modulator is exposed to temperature variation from 55°C to 25°C.
Keywords :
electro-optical effects; electro-optical modulation; lithium compounds; thermo-optical effects; 2 V; 25 to 55 degC; LiNbO3; Z-cut LiNbO3; bias point shift; bias polarity; bias rail; dc bias; field service; optical intensity modulators; temperature sensitivity; thermal shift; thermal shift growth; Accelerated aging; Helium; Intensity modulation; Life estimation; Optical modulation; Optical sensors; Rails; Temperature sensors; Testing; Voltage; Drift; optical intensity modulator; reliability;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2005.846560