Title :
Silica buried channel waveguides fabricated at low temperature using PECVD
Author :
Durandet, A. ; Perry, A. ; Boswell, R. ; Ladouceur, F. ; Love, J. ; Faith, M. ; Kemeny, P. ; Ma, X. ; Austin, M.
Author_Institution :
Plasma Res. Lab., Australian Nat. Univ., Canberra, ACT, Australia
fDate :
2/15/1996 12:00:00 AM
Abstract :
Buried channel waveguides made of silica films deposited on silicon substrates have been fabricated at low temperature (<100°C) without thermal annealing using the Helicon plasma deposition technique. The guides have losses as low as 1 dB/cm. A 1×8 splitter comprising concatenated Y-junctions has been fabricated and characterised
Keywords :
optical fabrication; optical losses; optical planar waveguides; plasma CVD; silicon; silicon compounds; 1×8 splitter; Helicon plasma deposition technique; PECVD; Si; SiO2-Si; buried channel waveguides; concatenated Y-junctions; losses; low temperature fabrication;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19960254
