DocumentCode
815838
Title
A General Harmonic Rule Controller for Run-to-Run Process Control
Author
He, Fangyi ; Wang, Kaibo ; Jiang, Wei
Author_Institution
Sch. of Syst. & Enterprises, Stevens Inst. of Technol., Hoboken, NJ
Volume
22
Issue
2
fYear
2009
fDate
5/1/2009 12:00:00 AM
Firstpage
232
Lastpage
244
Abstract
The existence of initial bias in parameter estimation is an important issue in controlling short-run processes in semiconductor manufacturing. Harmonic rule has been widely used in machine setup adjustment problems. This paper generalizes the harmonic rule to a new controller called general harmonic rule (GHR) controller in run-to-run process control. The stability and optimality of the GHR controller is discussed for a wide range of stochastic disturbances. A numerical study is performed to compare the sensitivity of the GHR controller, the exponentially weighted moving average (EWMA) controller and the variable EWMA controller. It is shown that the GHR controller is more robust than the EWMA controller when the process parameters are estimated with uncertainty.
Keywords
process control; semiconductor device manufacture; stochastic processes; exponentially weighted moving average controller; general harmonic rule controller; machine setup adjustment problems; parameter estimation; run-to-run process control; semiconductor manufacturing; short-run processes; stochastic disturbances; Manufacturing processes; Optimal control; Parameter estimation; Process control; Robust control; Semiconductor device manufacture; Stability; Stochastic processes; Uncertainty; Weight control; Automatic process control; EWMA; robust control; worst case;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2009.2017627
Filename
4909532
Link To Document