• DocumentCode
    815856
  • Title

    Strength and symmetry of the third-order nonlinearity during poling of glass waveguides

  • Author

    Marckmann, Carl J. ; Ren, Yitao ; Genty, Goëry ; Kristensen, Martin

  • Author_Institution
    COM, Tech. Univ. Denmark, Lyngby, Denmark
  • Volume
    14
  • Issue
    9
  • fYear
    2002
  • Firstpage
    1294
  • Lastpage
    1296
  • Abstract
    Negative thermal poling introduces second-order nonlinear effects into silica glass. The effects are studied using the charge separation model allowing for the third-order nonlinear effect to be anisotropic. The second-order nonlinear coefficient /spl chi//sup (2)/ is found to be consistent with the results reported previously by Arentoft et al. (1999), Ren et al. (2002), and Marckmann et al. (2001) and the third-order nonlinear coefficient /spl chi//sup (3)/ is found to be anisotropic but constant during poling.
  • Keywords
    Bragg gratings; Kerr electro-optical effect; Pockels effect; dielectric polarisation; nonlinear optical susceptibility; optical fabrication; optical glass; optical planar waveguides; ultraviolet radiation effects; Bragg gratings; Gaussian functions; Pockels effect; UV poling; buffer layer; charge separation model; cladding layer; core layer; electrooptic Kerr effect; negative thermal poling; optimal poling conditions; second-order nonlinear coefficient; silica glass waveguides; third-order nonlinear effect; transmission spectra; Anisotropic magnetoresistance; Annealing; Dielectric measurements; Doping; Electrooptic devices; Germanium; Glass; Nitrogen; Silicon compounds; Wavelength measurement;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2002.801595
  • Filename
    1032358