Title :
Impact Ionization Coefficients in 4H-SiC
Author :
Loh, W.S. ; Ng, B.K. ; Ng, J.S. ; Soloviev, Stanislav I. ; Cha, Ho-Young ; Sandvik, Peter M. ; Johnson, C.M. ; David, John P R
Author_Institution :
Dept. of Electron. & Electr. Eng., Univ. of Sheffield, Sheffield
Abstract :
Photomultiplication measurements using 244- and 325-nm excitation have been undertaken on a series of thick 4H-SiC avalanche diodes. With avalanche widths of between 2.7 and 6 mum and the ability to measure multiplication as low as 1.001, a much wider electric field range has been covered than reported to date. The results show that the hole ionization coefficient (beta) can be obtained with a high degree of accuracy down to electric fields as low as ~0.9 MV/cm. The value of electron ionization coefficient (alpha) has been determined from mixed carrier multiplication characteristics, and the beta/alpha ratio is found to increase significantly with decreasing electric fields. Ionization coefficients are parameterized over the electric field range from 0.9 to 5 MV/cm, enabling the multiplication and breakdown characteristics of 4H-SiC to be predicted accurately.
Keywords :
avalanche diodes; impact ionisation; photomultipliers; silicon compounds; wide band gap semiconductors; SiC; avalanche diodes; avalanche multiplication; breakdown voltage; impact ionization coefficients; photomultiplication measurements; wavelength 244 nm; wavelength 325 nm; Avalanche photodiodes; Charge carrier processes; Impact ionization; Pulse measurements; Schottky diodes; Semiconductor diodes; Silicon carbide; Temperature measurement; Thermal conductivity; Thickness measurement; Avalanche multiplication; avalanche photodiodes (APDs); breakdown voltage; impact ionization; ionization coefficients; local model;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2008.926679