DocumentCode :
816691
Title :
Radiation-hardened phototransistor
Author :
Matzen, W.T. ; Hawthorne, R.A. ; Kilian, W.T.
Author_Institution :
Micro Switch Div., Honeywell Inc., Richardson, TX, USA
Volume :
38
Issue :
6
fYear :
1991
fDate :
12/1/1991 12:00:00 AM
Firstpage :
1323
Lastpage :
1328
Abstract :
A radiation-hardened, monolithic, silicon bipolar phototransistor has been developed and produced. Common emitter current gain at 2 mA collector current is 225 and remains above 140 after irradiation of 1 E13 n/sq cm or 1 Mrad(Si). Device photoresponse to 820 nm light decreases about 30% after 1 Mrad(Si) exposure and 55% after 1 E13 n/sq cm irradiation for typical input light levels. This phototransistor is ideal for applications requiring a radiation-hardened optocoupler
Keywords :
bipolar transistors; elemental semiconductors; phototransistors; radiation hardening (electronics); silicon; 106 rad; 2 mA; 820 nm; Si; collector current; photoresponse; radiation-hardened optocoupler; semiconductors; Absorption; Detectors; Impurities; Neutrons; Photodiodes; Phototransistors; Radiation hardening; Silicon; Substrates; Switches;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.124112
Filename :
124112
Link To Document :
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