• DocumentCode
    816821
  • Title

    Analytical Modeling of High-Voltage 4H-SiC Junction Barrier Schottky (JBS) Rectifiers

  • Author

    Zhu, Lin ; Chow, T.P.

  • Author_Institution
    Power Integrations Inc., San Jose, CA
  • Volume
    55
  • Issue
    8
  • fYear
    2008
  • Firstpage
    1857
  • Lastpage
    1863
  • Abstract
    We develop a new analytical model for the junction barrier Schottky (JBS) rectifier and apply it to high-voltage 4H-SiC JBS rectifiers. This model uses a novel method to approximate the electric field at the Schottky contact, which is together with the Fowler-Nordheim tunneling equation to accurately calculate the reverse leakage current of a high-voltage 4H-SiC JBS rectifier. The forward on-resistance of a high-voltage 4H-SiC JBS rectifier consists of several components, which are dominated by the spreading resistances in the drift layer. Moreover, this model has been verified by comparing the simulation and experimental results, and they are shown to be in good agreement.
  • Keywords
    Schottky barriers; Schottky diodes; leakage currents; power semiconductor diodes; semiconductor device models; silicon compounds; solid-state rectifiers; tunnelling; Fowler-Nordheim tunneling equation; JBS rectifier; SiC; analytical model; drift layer; forward on-resistance; high-voltage 4H-SiC rectifiers; junction barrier Schottky rectifier; reverse leakage current; spreading resistances; Analytical models; Equations; Forward contracts; Leakage current; P-n junctions; Rectifiers; Schottky barriers; Silicon carbide; Tunneling; Voltage; 4H-SiC; High voltage; Schottky rectifier; junction barrier Schottky (JBS); model;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2008.926638
  • Filename
    4578906