Title :
Advanced High-Voltage 4H-SiC Schottky Rectifiers
Author :
Zhu, Lin ; Chow, T.P.
Author_Institution :
Rensselaer Polytech. Inst., Troy, NY
Abstract :
This paper presents advanced 4H-SiC high-voltage Schottky rectifiers with improved performance when compared to conventional 4H-SiC Schottky rectifiers. Two types of 4H-SiC junction barrier Schottky (JBS) rectifiers have been explored. These rectifiers offer Schottky-like ON-state and fast switching characteristics, while their OFF-state characteristics have a low leakage current similar to that of the PiN junction rectifier. Planar 4H-SiC JBS rectifiers, with more than 1-kV blocking capability and orders of magnitude lower reverse leakage current than that of conventional SiC Schottky rectifiers, have been demonstrated. In addition, a novel device structure, called lateral channel JBS rectifier, was designed and experimentally demonstrated in 4H-SiC with up to 1.5-kV blocking capability and pinlike reverse characteristics.
Keywords :
Schottky barriers; Schottky diodes; leakage currents; rectifying circuits; H-SiC; OFF-state characteristics; ON-state characteristics; blocking capability; high-voltage Schottky rectifier; junction barrier Schottky rectifier; lateral channel JBS rectifier; leakage current; pinlike reverse characteristics; Annealing; Breakdown voltage; Fabrication; Implants; Leakage current; P-n junctions; Rectifiers; Rough surfaces; Silicon carbide; Surface roughness; 4H-SiC; Junction Barrier Schottky (JBS); Schottky rectifier; power;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2008.926642