DocumentCode :
817
Title :
Deep Trenches in 
: Experimental Demonstration of Modulator Extinction Ratio Enhancement
Author :
Pointel, Anne-Laure ; Ulliac, G. ; Pawela, Yvan ; Hauden, Jerome
Author_Institution :
R&D, Photline Technol., Besançon, France
Volume :
25
Issue :
15
fYear :
2013
fDate :
Aug.1, 2013
Firstpage :
1500
Lastpage :
1502
Abstract :
We benefit from the recent progress on lithium niobate deep etching to enhance the extinction ratios of Mach-Zehnder modulators. We demonstrate that a proper trench placed in between parallel arms can lead to a 15 dB-increase without any additional losses at 1550 nm.
Keywords :
Mach-Zehnder interferometers; etching; lithium compounds; optical losses; optical modulation; LiNbO3; Mach-Zehnder modulator extinction ratio enhancement; deep trenches; lithium niobate deep etching; wavelength 1550 nm; Integrated optics; lithium niobate; microstructure; modulators; optical device fabrication;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2013.2270004
Filename :
6544202
Link To Document :
