• DocumentCode
    817
  • Title

    Deep Trenches in {\\rm LiNbO}_{3} : Experimental Demonstration of Modulator Extinction Ratio Enhancement

  • Author

    Pointel, Anne-Laure ; Ulliac, G. ; Pawela, Yvan ; Hauden, Jerome

  • Author_Institution
    R&D, Photline Technol., Besançon, France
  • Volume
    25
  • Issue
    15
  • fYear
    2013
  • fDate
    Aug.1, 2013
  • Firstpage
    1500
  • Lastpage
    1502
  • Abstract
    We benefit from the recent progress on lithium niobate deep etching to enhance the extinction ratios of Mach-Zehnder modulators. We demonstrate that a proper trench placed in between parallel arms can lead to a 15 dB-increase without any additional losses at 1550 nm.
  • Keywords
    Mach-Zehnder interferometers; etching; lithium compounds; optical losses; optical modulation; LiNbO3; Mach-Zehnder modulator extinction ratio enhancement; deep trenches; lithium niobate deep etching; wavelength 1550 nm; Integrated optics; lithium niobate; microstructure; modulators; optical device fabrication;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2013.2270004
  • Filename
    6544202
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=817