Title :
Experimental demonstration of replicated multimode interferometer power splitter in Zr-doped sol-gel
Author :
Kim, Je Hong ; Dudley, Bruce W. ; Moyer, Patrick J.
Author_Institution :
Dept. of Phys., Univ. of North Carolina, Charlotte, NC, USA
Abstract :
A single-mode waveguide and a 1 × 3 multimode interference (MMI) power splitter are fabricated in hybrid zirconium (Zr)-doped sol-gel material by a microreplication technology with a polydimethylsiloxane (PDMS) replica. The power splitter, as optimized using a finite-difference beam-propagation method (FD-BPM) simulation with self-imaging effects, represents one of the first experimental demonstrations of a high-tolerance manufactured device using replication methods. The fabrication of the microreplicated power splitter demonstrates high-quality optical and geometrical properties. The local uniformity in thickness of the multimode waveguide is less than 1.0%, and the average surface roughness is about 5.35 nm. The measured splitting loss is less than 0.6 dB for both transverse polarizations at the 1550-nm wavelength. Experimental achievements indicate that the soft lithography technology allows for the performance of applications in integrated optical devices in Zr-doped sol-gel materials with high standards.
Keywords :
finite difference methods; light interferometers; micro-optics; optical beam splitters; optical fabrication; optical losses; replica techniques; sol-gel processing; surface roughness; zirconium; 1550 nm; Zr-doped sol-gel; finite-difference beam-propagation; microreplication; multimode interferometer power splitter; multimode waveguide; polydimethylsiloxane replica; self-imaging effect; soft lithography; splitting loss; surface roughness; transverse polarization; Finite difference methods; Geometrical optics; Interference; Optical device fabrication; Optical interferometry; Optical materials; Optical waveguides; Optimization methods; Virtual manufacturing; Zirconium; Multimode interference device, planar waveguides, power splittes, sol-gel;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2005.859849